Enhancing FeFET Performance Through H<sub>2</sub> Plasma Treatment: Improving Stability, Conductance, and Hamming Distances in FeCAM Designs
Zhongping Huang, Ying–Tsan Tang(National Central University), Z.-K. Chen(National Central University), C. S. Pai(National Central University), W. N. Chang(Taiwan Semiconductor Manufacturing Company (Taiwan)), Chih‐Ying Lin(Taiwan Semiconductor Manufacturing Company (Taiwan)), Yi‐Ting Tsai(National Yang Ming Chiao Tung University)
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