Microwave plasma modification-assisted shear-thickening polishing of single-crystal silicon carbide
Mingjie Shen(Shaanxi University of Science and Technology), Wei Hang(Zhejiang University of Technology), Hongyu Chen(Zhejiang University of Technology), Min Wei(Zhejiang University of Technology), Jiahao Ye(Fuyang Normal University), Chuansheng Wang(Southern University of Science and Technology), Lingwei Wu(Zhejiang University of Technology), Hui Deng(Ministry of Education of the People's Republic of China), Julong Yuan(Zhejiang University of Technology), Binghai Lyu(Zhejiang University of Technology)
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