(Invited) ALD HfZrO<sub>2</sub> Films from Ferroelectric to High-k Applications
Alessandra Leonhardt(ASM International (Finland)), A. Illiberi(ASM International (Belgium)), Mihaela Balseanu, Ranjith K. Ramachandran(Ghent University Hospital), Vivek Mootheri(ASM International (Belgium)), Rohit Abraham John(Nanyang Technological University), M. D. Surman, Jessica Cimada, Michael Givens(ASM International (Belgium)), Michael Schmotzer, Fu Tang(ASM International)
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