Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error controlYosuke Kojima, Ken Ozawa, Yukio Inazuki et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|2007Cited by 5
Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error controlYosuke Kojima, Ken Ozawa, Masanori Shirasaki et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|2007Cited by 1