UV absorption spectrum of the radical CF 2 in an Ar/C_4F_8/O 2 dual frequency capacitive discharge

Nicolas Bulcourt(École Polytechnique), Foo‐Tim Chau(Hong Kong Polytechnic University), Eric Hudson(University of California, Los Angeles), Jean‐Paul Booth(Centre National de la Recherche Scientifique), Edmond Lee, Jorge Luque(Lam Research (United States)), Daniel Kam‐Wah Mok(Hong Kong Polytechnic University), John M. Dyke(University of Southampton)
APS Annual Gaseous Electronics Meeting Abstracts
October 1, 2003
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