In Situ-Doped Silicon Thin Films for Passivating Contacts by Hot-Wire Chemical Vapor Deposition with a High Deposition Rate of 42 nm/min
Shenghao Li(Sun Yat-sen University), Kaining Ding(Forschungszentrum Jülich), Ruijiang Hong(Kunming University of Science and Technology), Manuel Pomaska(Forschungszentrum Jülich), Uwe Rau(RWTH Aachen University), Jan Lossen(International Solar Energy Research Center Konstanz), F. Finger(Forschungszentrum Jülich), Jan Hoß(International Solar Energy Research Center Konstanz), Mirko Ziegner(Forschungszentrum Jülich)
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