Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage
Faizan Ali(Chinese Academy of Sciences), Xianlin Dong(Chinese Academy of Sciences), Uwe Schroeder(NaMLab (Germany)), Tony Schenk(NaMLab (Germany)), Dayu Zhou(University of Electronic Science and Technology of China), Xirui Yang(Chinese Academy of Sciences), Jin Xu, Xiaohua Liu(Chinese Academy of Sciences), Fei Cao(Amherst College), Johannes Müller(Fraunhofer Institute for Photonic Microsystems)
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