New cost effective ZnO:Al films deposited by large area reactive magnetron sputtering

V. Sittinger(Fraunhofer Institute for Surface Engineering and Thin Films), A. Lopp(Siemens (Germany)), Bernd Szyszka(Fraunhofer Institute for Surface Engineering and Thin Films), Ruijiang Hong(Kunming University of Science and Technology), M. Ruske(Siemens (Germany)), Wolfgang Werner(TU Wien)
Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft)
May 18, 2003
Cited by 1


Related Papers