The Rayleigh law in silicon doped hafnium oxide ferroelectric thin films
Yan Guan(Dalian University of Technology), Uwe Schroeder(NaMLab (Germany)), Tony Schenk(NaMLab (Germany)), Fei Cao(Amherst College), Jin Xu, Xiaohua Liu(Chinese Academy of Sciences), Dayu Zhou(University of Electronic Science and Technology of China), Xianlin Dong(Chinese Academy of Sciences), Johannes Müller(Fraunhofer Institute for Photonic Microsystems)
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