Composition and Growth Kinetics of the Interfacial Layer for MOCVD HfO[sub 2] Layers on Si Substrates
Sven Van Elshocht(Columbia University), Marc Heyns(IMEC), Matty Caymax(IMEC), Stefan De Gendt(Imec the Netherlands), J. Pétry(Service Public Fédéral Économie), L. Daté(Imec the Netherlands), D. Pique(Imec the Netherlands), Thierry Conard(IMEC)
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