Ultrahigh growth rate of epitaxial silicon by chemical vapor deposition at low temperature with neopentasilane
Keith Chung(Princeton University), Satheesh Kuppurao(Applied Materials (United States)), Nan Yao(Princeton University), Kavita Singh(Applied Materials (United States)), Jay B. Benziger(Princeton University), James C. Sturm(Princeton University), David R. Carlson(Photonics (United States))
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