Ultrahigh growth rate of epitaxial silicon by chemical vapor deposition at low temperature with neopentasilaneKeith Chung, Satheesh Kuppurao, Kavita Singh et al.|Applied Physics Letters|2008Cited by 41
Chemical Vapor Deposition Epitaxy of Silicon-based Materials using NeopentasilaneJames C. Sturm, Keith Chung|ECS Transactions|2008Cited by 23