HfO2 as gate dielectric on Ge: Interfaces and deposition techniques
Matty Caymax(IMEC), Lyudmila V. Goncharova(Rutgers, The State University of New Jersey), A. Dimoulas(National Centre of Scientific Research "Demokritos"), Annelies Delabie(IMEC), Michel Houssa(IMEC), Thierry Conard(IMEC), Marc Heyns(IMEC), Sven Van Elshocht(Columbia University), Marc Meuris(IMEC), M. Fanciulli(University of Milano-Bicocca), Jin Won Seo(KU Leuven), Sabina Spiga(Semiconductor Manufacturing International (Italy))
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