50−nm silicon structures fabricated with trilevel electron beam resist and reactive-ion etching

L. D. Jackel, P. Grabbe, Evelyn L. Hu(Harvard University Press), D. M. Tennant(University of Tennessee at Knoxville), Richard Howard(Samsung (United States))

Applied Physics Letters

August 1, 1981

10.1063/1.92668

Cited by 44

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