Formation of precipitates in heavily boron doped 4H-SiC

M. K. Linnarsson(KTH Royal Institute of Technology), Adolf Schöner(Kista Photonics Research Center), J. Wong‐Leung(Australian National University), Martin S. Janson(KTH Royal Institute of Technology), N. Nordell(KTH Royal Institute of Technology)
Applied Surface Science
January 19, 2006
Cited by 17


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