Optimized germanium co-implant with B2H6 PLAD for better advanced PMOS device performance

Lequn Jennifer Liu(Micron (United States)), Allen McTeer(Micron (United States)), Shu Qin(Micron (United States)), Yongjun Hu(South China Normal University)
Surface and Coatings Technology
May 12, 2012
Cited by 6


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