Effects of implant temperature on process characteristics of low energy boron implanted silicon
Lequn Jennifer Liu(Micron (United States)), Allen McTeer(Micron (United States)), Kyle D. Brumfield(University of Maryland, College Park), Yongjun Hu(South China Normal University), Wendy Morinville(Micron (United States)), Wei Hui Hsu(Micron (United States)), Radha Padmanabhan(Micron (United States)), Shu Qin(Micron (United States))
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