Characterization of surface modification in atomic force microscope-induced nanolithography of oxygen deficient La0.67Ba0.33MnO3−δ thin films
E. K. Tanyi(Norfolk State University), David Schaefer(Towson University), Christopher Stumpf(Towson University), Parul Srivastava(Towson University), Rajeswari Kolagani(Towson University), William E. Vanderlinde(Cornell University), Grace Yong(Towson University)
Cited by 2
Related Papers
Scanning SQUID microscopy for current imaging
|Microelectronics Reliability|2001|49
Reactive ion beam etching of polyimide thin films
|Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena|1988|33
Thermal stability of SrTiO3/SiO2/Si Interfaces at Intermediate Oxygen Pressures
|Journal of Applied Physics|2010|18
Blind Deconvolution of SEM Images
|Proceedings - International Symposium for Testing and Failure Analysis|2007|12
Polymer diffusion as a probe of damage in ion or plasma etching
|Journal of Applied Physics|1990|11