IBA study of the growth mechanisms of very thin silicon oxide films: the effect of wafer cleaning

F. C. Stedile(Centre National de la Recherche Scientifique), Harry Becker(Ruhr University Bochum), S. Rigo(Centre National de la Recherche Scientifique), I. J. R. Baumvol(Centre National de la Recherche Scientifique), J.‐J. Ganem(Centre National de la Recherche Scientifique), G. Battistig(Institute for Technical Physics and Materials Science), W.H. Schulte(Ruhr University Bochum), I. Trimaille(Centre National de la Recherche Scientifique)
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
March 1, 1994
10.1016/0168-583x(94)95821-1
Cited by 13

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