IBA study of the growth mechanisms of very thin silicon oxide films: the effect of wafer cleaningF. C. Stedile, Harry Becker, I. J. R. Baumvol et al.|Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms|1994Cited by 13
High resolution low energy resonance depth profiling of18O in near surface isotopic tracing studiesG. Battistig, Harry Becker, S. Rigo et al.|Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms|1994Cited by 13