IBA study of the growth mechanisms of very thin silicon oxide films: the effect of wafer cleaningF. C. Stedile, Harry Becker, I. J. R. Baumvol et al.|Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms|1994Cited by 13
High resolution depth profiling in near-surface regions of solids by narrow nuclear reaction resonances below 0.5 MeV with low energy spread proton beamsW.H. Schulte, J.S. Schweitzer, GE Mitchell et al.|Vacuum|1993Cited by 13
High resolution low energy resonance depth profiling of18O in near surface isotopic tracing studiesG. Battistig, Harry Becker, I. J. R. Baumvol et al.|Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms|1994Cited by 13