Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications

D. M. Tennant(University of Tennessee at Knoxville), M.G. Young(AT&T (United States)), U. Koren(AT&T (United States)), K.F. Dreyer(AT&T (United States)), B.I. Miller(AT&T (United States)), Thomas Koch(University of Arizona), K. Feder(AT&T (United States)), R. P. Gnall(AT&T (United States))

Microelectronic Engineering

February 1, 1995

10.1016/0167-9317(94)00139-l

Cited by 13

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