Advances in near field holographic grating mask technologyD. M. Tennant, Matthew Young, Thomas Koch et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1994Cited by 18
Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applicationsD. M. Tennant, M.G. Young, K. Feder et al.|Microelectronic Engineering|1995Cited by 13