Resistive switching behavior of a CeO2 based ReRAM cell incorporated with Si buffer layer

Chunmeng Dou(Chinese Academy of Sciences), Hiroshi Iwai(Kyoto University), Nobuyuki Sugii(Tokyo Institute of Technology), Akira Nishiyama(Kagawa University), K. Tsutsui(Tokyo Institute of Technology), Takanori Hattori(Musashi University), Kuniyuki Kakushima(Tokyo Institute of Technology), Parhat Ahmet(National Institute for Materials Science), Kenji Natori(Chiba University)
Microelectronics Reliability
November 16, 2011
Cited by 45


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