Fluorine-vacancy complexes in ultrashallow B-implanted Si
D. A. Abdulmalik(University of Bath), F. Cristiano(Centre National de la Recherche Scientifique), Andrew J. Smith(Intel (United States)), B.J. Sealy(University of Surrey), P. G. Coleman(Committee on Climate Change), W. Lerch(Daimler (Germany)), N. E. B. Cowern(University of Surrey), S. Paul(Daimler (Germany))
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