Separation of vacancy and interstitial depth profiles in ion-implanted silicon: Experimental observation

P. Pellegrino(KTH Royal Institute of Technology), B. G. Svensson(KTH Royal Institute of Technology), J. Wong‐Leung(Australian National University), C. Jagadish(Australian National University), Patrick Lévêque(KTH Royal Institute of Technology)
Applied Physics Letters
May 28, 2001
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