LDD implant process optimization for high voltage NMOS improvement
Lequn Jennifer Liu(Micron (United States)), Allen McTeer(Micron (United States)), Nick McLean(Micron (United States)), Kyle D. Brumfield(University of Maryland, College Park), Yongjun Hu(South China Normal University), В. А. Михалев(Micron (United States)), Mike Smith(Micron (United States)), Mike Evans(Micron (United States)), Shu Qin(Micron (United States))
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