Two-dimensional cross-sectional doping profiling of boron-based low energy high dose ion implantations using Electron Holography technique
Shu Qin(Micron (United States)), Jaydip Guha(Micron (United States)), Zhouguang Wang(Wenzhou Medical University), Allen McTeer(Micron (United States)), Yongjun Hu(South China Normal University), R. Burke(Micron (United States)), Canbing Li(Shanghai Jiao Tong University)
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