Twenty-five nm features patterned with trilevel e-beam resistD. M. Tennant(University of Tennessee at Knoxville), B. S. Schneider, Evelyn L. Hu(Harvard University Press), L. D. Jackel, R. E. Howard, R.J. Capik, P. GrabbeJournal of Vacuum Science and TechnologyNovember 1, 198110.1116/1.571265Cited by 26SaveCiteExport RISWatch citationsRelated PapersProximate Kitaev quantum spin liquid behaviour in a honeycomb magnet|Unknown|2016|863Quantum Spintronics: Engineering and Manipulating Atom-Like Spins in Semiconductors|Science|2013|758Neutron scattering in the proximate quantum spin liquid α-RuCl <sub>3</sub>|Science|2017|724Quantum Criticality in an Ising Chain: Experimental Evidence for Emergent E <sub>8</sub> Symmetry|Science|2010|722Discrete Resistance Switching in Submicrometer Silicon Inversion Layers: Individual Interface Traps and Low-Frequency (<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mfrac><mml:mrow><mml:mn>1</mml:mn></mml:mrow><mml:mrow><mml:mi>f</mml:mi></mml:mrow></mml:mfrac></mml:math>?) Noise|Physical Review Letters|1984|711