High aspect ratio 0.1 μm tungsten gates for InGaAs/InAlAs heterojunction transistors

D. M. Tennant(University of Tennessee at Knoxville), R. W. Epworth, R. E. Behringer(AT&T (United States)), J-M. Kuo(AT&T (United States)), T. Y. Chang(AT&T (United States)), S.C. Shunk(AT&T (United States)), M.D. Feuer(AT&T (United States))
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
November 1, 1989
Cited by 11


Related Papers