400-Å linewidth <i>e</i>-beam lithography on thick silicon substratesRichard Howard(Samsung (United States)), D. M. Tennant(University of Tennessee at Knoxville), L. D. Jackel, P. Grabbe, Evelyn L. Hu(Harvard University Press)Applied Physics LettersApril 1, 198010.1063/1.91558Cited by 32SaveCiteExport RISWatch citationsRelated PapersProximate Kitaev quantum spin liquid behaviour in a honeycomb magnet|Unknown|2016|863Quantum Spintronics: Engineering and Manipulating Atom-Like Spins in Semiconductors|Science|2013|758Neutron scattering in the proximate quantum spin liquid α-RuCl <sub>3</sub>|Science|2017|724Quantum Criticality in an Ising Chain: Experimental Evidence for Emergent E <sub>8</sub> Symmetry|Science|2010|722Discrete Resistance Switching in Submicrometer Silicon Inversion Layers: Individual Interface Traps and Low-Frequency (<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mfrac><mml:mrow><mml:mn>1</mml:mn></mml:mrow><mml:mrow><mml:mi>f</mml:mi></mml:mrow></mml:mfrac></mml:math>?) Noise|Physical Review Letters|1984|711