Stress development in sputtered NiO thin films during heat treatment

W. Brückner(Leibniz Institute for Solid State and Materials Research), Claus M. Schneider(Forschungszentrum Jülich), Steffen Oswald(Leibniz Institute for Solid State and Materials Research), M. Hecker(Leibniz Institute for Solid State and Materials Research), R. Kaltofen(Leibniz Institute for Solid State and Materials Research), D. Elefant(Leibniz Institute for Solid State and Materials Research), Margitta Uhlemann(Leibniz Institute for Solid State and Materials Research), J. Thomas(University of Calicut)
Journal of Applied Physics
October 3, 2003
Cited by 29


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