CF A 2Σ+–X 2Π and B 2Δ–X 2Π study by broadband absorption spectroscopy in a plasma etch reactor: Determination of transition probabilities, CF X 2Π concentrations, and gas temperatures
Jorge Luque(Lam Research (United States)), Jean‐Paul Booth(Centre National de la Recherche Scientifique), Eric A. Hudson(Freie Universität Berlin)
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