Enhanced Performance of P-FeFETs with TiN:2.5nm/Mo/TiN Gate Stacks for 3-Bit-Per-Cell Operation, 3.5V Read-After-Write, and High Endurance (10<sup>9</sup> Cycles) in Compute-in-Memory ApplicationsChin‐Yi Tsai, Ying–Tsan Tang, Ming-Wei Hsiung et al.|Unknown|2025Cited by 0