Environmental data and facts in the semiconductor manufacturing industry: An unexpected high water and energy consumption situationQi Wang, Yunpeng Wu, Nan Huang et al.|Water Cycle|2023Cited by 114
Water strategies and practices for sustainable development in the semiconductor industryQi Wang, Yin-Hu Wu, Xiaowen Chen et al.|Water Cycle|2022Cited by 50
Urea removal for ultrapure water production by VUV/UV/chlorine under acidic aqueous conditions: Facile elimination and efficient denitrificationQi Wang, Hong‐Ying Hu, Nan Huang et al.|Journal of Cleaner Production|2023Cited by 41
Elimination of amino trimethylene phosphonic acid (ATMP) antiscalant in reverse osmosis concentrate using ozone: Anti-precipitation property changes and phosphorus removalNan Huang, Hong‐Ying Hu, Qi Wang et al.|Chemosphere|2021Cited by 38
Ozonation of phosphonate antiscalant 1-hydroxyethane-1,1-diphosphonic acid in reverse osmosis concentrate: Kinetics, phosphorus transformation, and anti-precipitation property changesNan Huang, Hong‐Ying Hu, Zi-Bin Xu et al.|Separation and Purification Technology|2022Cited by 31