Parameters for <i>i</i> <i>n</i> <i>s</i> <i>i</i> <i>t</i> <i>u</i> growth of high <i>T</i> <i>c</i> superconducting thin films using an oxygen plasma sourceR.J. Spah, K. T. Short, Harald F. Hess et al.|Applied Physics Letters|1988Cited by 54