Parameters for <i>i</i> <i>n</i> <i>s</i> <i>i</i> <i>t</i> <i>u</i> growth of high <i>T</i> <i>c</i> superconducting thin films using an oxygen plasma source

R.J. Spah(AT&T (United States)), K. T. Short(AT&T (United States)), Harald F. Hess(Janelia Research Campus), Alice E. White(AT&T (United States)), H. L. Störmer
Applied Physics Letters
August 1, 1988
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