XAFS studies of Al/TiN<sub> <i>x</i> </sub> films on Si(100) at the Al <i>K</i>- and <i>L</i> <sub>3,2</sub>-edgeZhaorui Zou, L. Chan, Tsun‐Kong Sham et al.|Journal of Synchrotron Radiation|1999Cited by 6