XAFS studies of Al/TiN<sub> <i>x</i> </sub> films on Si(100) at the Al <i>K</i>- and <i>L</i> <sub>3,2</sub>-edge
Zhaorui Zou, L. Chan, Yongfeng Hu(Sinopec (China)), Huili Huang, C. S. Seet, Tsun‐Kong Sham(Western University), Guo Qin Xu(Chongqing University)
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