Evaluation of Polarization-Induced Interface Degradations in FeFETs Using Quasi-Static Split C-V Techniques: Comparison of Oxide-Semiconductor and Si Channels
Xiaoyong Gao, Kasidit Toprasertpong(The University of Tokyo), Yan-Kui Liang(National Yang Ming Chiao Tung University), Eishin Nako, Zuocheng Cai, Mitsuru Takenaka, Jin Zhao, Zhenghong Liu, Yutong Chen(Dalian Ocean University), Shin-Yi Min, Shinichi Takagi, Xueyang Han(The University of Tokyo)
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