Electron‐Beam Excited Conductive Atomic Force Microscopy for Back Contact Free, Wafer‐Scale and In‐Line Compatible Electrical Characterization of 2D Materials
Md Ashiqur Rahman Laskar(Arizona State University), Umberto Celano(Arizona State University), S.M. Masum Ahmed(Arizona State University), Youssry Y. Botros(Northwestern University), Pinaka Pani Tummala(Semiconductor Manufacturing International (Italy)), Ivan Sanchez Esqueda(Arizona State University), Alessio Lamperti(Semiconductor Manufacturing International (Italy)), Ondřej Novotný(University Hospital Brno), Jan Neuman(University Hospital Brno), Alessandro Molle, Rob Davenport(Applied Materials (United States)), Milan Pešić(Applied Materials (United States)), Fabrizio Toia(STMicroelectronics (Italy)), Renee Sailus(Arizona State University), Sefaattin Tongay(University of California, Berkeley)
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