High‐<i>κ</i> Dielectric (HfO<sub>2</sub>)/2D Semiconductor (HfSe<sub>2</sub>) Gate Stack for Low‐Power Steep‐Switching Computing Devices
Taeho Kang(Sungkyunkwan University), Nayeong Lee(Seoul National University of Science and Technology), Jongwook Jeon, Hanggyo Jung(The University of Texas at Dallas), Cheol‐Woong Yang(Sungkyunkwan University), Hyung‐jun Kim(Korea Institute of Science and Technology), Ryong‐Gyu Lee(Korea Advanced Institute of Science and Technology), Sungjoo Lee(Tohoku University), Haeju Choi(Samsung (South Korea)), Joonho Park(Korea Advanced Institute of Science and Technology), Sang‐Min Lee(Sahmyook Medical Center), Seung‐Hwan Kim(Korea Advanced Institute of Science and Technology), Gahye Kim(Korea Institute of Science and Technology), Yong‐Hoon Kim(Korea Advanced Institute of Science and Technology)
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