Temperature-Dependent Oxygen Annealing Effect on the Properties of Ga2o3 Thin Film Deposited by Atomic Layer Deposition

Lin Gu(Tianjin University of Science and Technology), Qing‐Chun Zhang(Ningbo University), Yi Shen(Fudan University), Ruo-Yun Yang(Fudan University), Lei Yang(Wuhan University of Technology), Hongping Ma(Fudan University), Wenjie Chen(Xiamen University), Jingtao Zhu(Fujian Medical University), Yu-Hang Zeng(Fudan University), Xi-Rui Wang(Fudan University), Fanzhengshu Wu(Fudan University), Jie Zhang(Fudan University)
SSRN Electronic Journal
January 1, 2022
Cited by 4


Related Papers