Roughness Reduction Processing of 4H-SiC 3D structure formed by Dry Etching Process
Tadashi Sato(Hiroshima University), Shin-Ichiro Kuroki(Hiroshima University), Vuong Van Cuong(Hiroshima University), R. Takeuchi(Hiroshima University), Takuma SHIMA(Hiroshima University)
Unknown
July 6, 2021
Cited by 0
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