Electric Field Tuning of Interlayer Coupling in Noncentrosymmetric 3R-MoS<sub>2</sub> with an Electric Double Layer Interface
Xi Zhang(Nanyang Technological University), Hongtao Yuan(National Engineering Research Center of Electromagnetic Radiation Control Materials), Dongqin Zhang(Collaborative Innovation Center of Advanced Microstructures), Xiangyu Bi(Collaborative Innovation Center of Advanced Microstructures), Ming Tang(Collaborative Innovation Center of Advanced Microstructures), Zeya Li(Collaborative Innovation Center of Advanced Microstructures), Caorong Zhang(Collaborative Innovation Center of Advanced Microstructures), Junwei Huang(Collaborative Innovation Center of Advanced Microstructures), Caiyu Qiu(Nanyang Technological University), Xueting Dai(Collaborative Innovation Center of Advanced Microstructures), Tong Su(Collaborative Innovation Center of Advanced Microstructures), Tongshuai Zhu(Collaborative Innovation Center of Advanced Microstructures), Qian Wang(Huaqiao University), Haijun Zhang(Johns Hopkins University), Kui Meng(Collaborative Innovation Center of Advanced Microstructures), Ling Zhou(Collaborative Innovation Center of Advanced Microstructures), Weiwei Zhao(State Key Laboratory of Analytical Chemistry for Life Science), Xin Cong(Chinese Academy of Sciences), Ping‐Heng Tan(Institute of Semiconductors)
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