Electric Field Tuning of Interlayer Coupling in Noncentrosymmetric 3R-MoS<sub>2</sub> with an Electric Double Layer Interface
Xi Zhang(Nanyang Technological University), Hongtao Yuan(SLAC National Accelerator Laboratory), Dongqin Zhang(Collaborative Innovation Center of Advanced Microstructures), Xiangyu Bi(Collaborative Innovation Center of Advanced Microstructures), Ming Tang(Collaborative Innovation Center of Advanced Microstructures), Zeya Li(Quantum Science Center of Guangdong-Hong Kong-Macao Greater Bay Area), Caorong Zhang(Collaborative Innovation Center of Advanced Microstructures), Junwei Huang(Collaborative Innovation Center of Advanced Microstructures), Caiyu Qiu(Nanyang Technological University), Xueting Dai(Collaborative Innovation Center of Advanced Microstructures), Tong Su(Collaborative Innovation Center of Advanced Microstructures), Tongshuai Zhu(Collaborative Innovation Center of Advanced Microstructures), Qian Wang(Chengdu Military General Hospital), Haijun Zhang(Collaborative Innovation Center of Advanced Microstructures), Kui Meng(Collaborative Innovation Center of Advanced Microstructures), Ling Zhou(Collaborative Innovation Center of Advanced Microstructures), Weiwei Zhao(Baoji University of Arts and Sciences), Xin Cong(Chinese Academy of Sciences), Ping‐Heng Tan(Chinese Academy of Sciences)
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