Fabrication and Characterization of a Novel Si Line Tunneling TFET With High Drive Current

Weijun Cheng(Institute of Microelectronics), Jun Xu(Institute of Microelectronics), Huaxiang Yin(Chinese Academy of Sciences), Guofang Yu(Institute of Microelectronics), Gaobo Xu(University of Chinese Academy of Sciences), Renrong Liang(Institute of Microelectronics), Tian‐Ling Ren(Tsinghua University), Chao Zhao(Chinese Academy of Sciences), Shuqin Zhang(Institute of Microelectronics)
IEEE Journal of the Electron Devices Society
January 1, 2020
Cited by 57


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