Top-Gate Amorphous Indium-Gallium-Zinc-OxideThin-Film Transistors With Magnesium Metallized Source/Drain Regions

Hao Peng(Peking University), Shengdong Zhang(Peking University), Haishi Fu(Peking University), Yuqing Zhang(Fujian Medical University), Lei Lü(Peking University), Huan Yang(Peking University), Baozhu Chang(Peking University), Xiaoliang Zhou(Peking University)
IEEE Transactions on Electron Devices
March 5, 2020
Cited by 31


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