Effect of arginine-based cleaning solution on BTA residue removal after Cu-CMP
Qi Wang(Tianjin University of Technology), Baimei Tan(Tianjin University of Technology), Xiaoqin Sun(Tianjin University of Technology), Da Yin(Tianjin University of Technology), Mengrui Liu(Columbia University Irving Medical Center), Siyu Tian(Central South University), Shihao Zhang(Tianjin University of Technology), Baohong Gao(Tianjin University of Technology)
Colloids and Surfaces A Physicochemical and Engineering Aspects
November 28, 2019
Cited by 57
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