Self-Aligned Top-Gate Amorphous InGaZnO TFTs With Plasma Enhanced Chemical Vapor Deposited Sub-10 nm SiO<sub>2</sub> Gate Dielectric for Low-Voltage Applications

Yuqing Zhang(Fujian Medical University), Shengdong Zhang(Peking University), Huan Yang(Peking University), Hao Peng(Peking University), Yunkai Cao(Peking University), Ludong Qin(Peking University)
IEEE Electron Device Letters
July 26, 2019
Cited by 37


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