Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications
Bader Alharthi(University of Arkansas at Fayetteville), Shui-Qing Yu(Nanyang Technological University), Perry C. Grant(University of Arkansas at Fayetteville), Timothy A. Morgan(Naval Surface Warfare Center), Joshua M. Grant(University of Arkansas at Fayetteville), Baohua Li(University Town of Shenzhen), Aboozar Mosleh(University of Arkansas at Pine Bluff), Hameed A. Naseem(University of Arkansas at Fayetteville), Wei Dou(China University of Petroleum, East China), Mansour Mortazavi(University of Arkansas at Pine Bluff), Wei Du(Wilkes University)
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